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Versum Materials Inc., Wilmington, United States

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Versum Materials Inc.

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Name

Versum Materials Inc.
Versum Materials US LLC

Identification

Lei
5493002OKGMKU0JRO229 5493006QY0E0EST2ZX08

Address

c/o THE CORPORATION TRUST COMPANY, CORPORATION TRUST CENTER, 1209 Orange St, Wilmington 19801, United States

History

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Legal Structure

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One known shareholder
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Publications

28 Oct 2026
Patent: Compositions and processes For films with silicon and BOR
11 Jun 2026 via E. Merck KG also 11/06/2026, 11/06/2026, 26/05/2025, 21/05/2024, 06/04/2023, 22/04/2022, 26/04/2021, 09/06/2020
Shareholder: E. Merck KG
6 May 2026 via MERCK KGaA also 06/06/2025, 28/05/2025, 05/08/2024, 20/09/2023, 17/04/2023, 17/04/2023, 06/05/2022, 02/05/2022, 09/06/2020, 08/06/2020
Shareholder: MERCK KGaA
Year 2025 in Epobase
4 European patent filings: New Precursors for Depositing Films with High Elastic Modulus …
8 Aug 2024 as Versum Materials US LLC
Patent: System and method for design-oriented time locking for face-to-face bonding
18 Jul 2023 as Versum Materials US LLC
Patent: Optimization of the Bottom Electrode to Improve Ferroelectric Performance in Hafnia-Based Oxide with Back-End-of-Line (BEOL)-Compatible Process
10 May 2023 as Versum Materials US LLC
Patent: Compositions and processes for use thereof for carbon-doped silicon-containing films
25 Jan 2023 as Versum Materials US LLC
Patent: Halogenide-Functionalized Cyclotrisilazanes as Precursors for the Deposition of Silicon-Containing Films
29 Nov 2022 as Versum Materials US LLC
Patent: Chemical Mechanical Polishing Slurries of Tungsten
18 Oct 2022 as Versum Materials US LLC
Patent: Silanols and Silanediols
13 Jul 2022 as Versum Materials US LLC
Patent: Processes for the deposition of silicon-containing films
30 Nov 2021 as Versum Materials US LLC
Patent: Selective Thermal Atomic Layer Deposition
15 Nov 2021 as Versum Materials US LLC
Patent: Selective Deposition of Silicon and Oxygen Containing Dielectric Film on Dielectrics
23 Jul 2021 as Versum Materials US LLC
Patent: Cyclosiloxane and Films Made Therefrom
Year 2020 in Epobase
4 European patent filings: Photoresist remover …
3 Mar 2020
Word figurative mark: “SYTON“
6 Aug 2019
U.S. Securities and Exchange Commission's Electronic Data Gathering, Analysis, and Retrieval system
7 May 2019
U.S. Securities and Exchange Commission's Electronic Data Gathering, Analysis, and Retrieval system
2 May 2019 as Versum Materials US LLC
Wordmark: “Com-PAT“
14 Mar 2019 as Versum Materials US LLC
Wordmark: “K-REST“
7 Feb 2019
U.S. Securities and Exchange Commission's Electronic Data Gathering, Analysis, and Retrieval system
21 Nov 2018
U.S. Securities and Exchange Commission's Electronic Data Gathering, Analysis, and Retrieval system
8 Aug 2018
U.S. Securities and Exchange Commission's Electronic Data Gathering, Analysis, and Retrieval system
25 May 2018 as Versum Materials US LLC
Word figurative mark: “SELECTFLUOR“
9 May 2018
U.S. Securities and Exchange Commission's Electronic Data Gathering, Analysis, and Retrieval system
8 Feb 2018
U.S. Securities and Exchange Commission's Electronic Data Gathering, Analysis, and Retrieval system
14 Dec 2017 as Versum Materials US LLC
Word figurative mark: “nCtrl“
22 Nov 2017
U.S. Securities and Exchange Commission's Electronic Data Gathering, Analysis, and Retrieval system
Year 2017 in Epobase
4 European patent filings: Disubstituted Alkyne Dicobalt Hexacarbonyl Compounds, Method of Making and Method of USE Thereof …
4 Aug 2017
U.S. Securities and Exchange Commission's Electronic Data Gathering, Analysis, and Retrieval system
13 Jun 2017
Word figurative mark: “SELECTFLUOR“
12 Jun 2017
Word figurative mark: “SYTON“
5 May 2017
U.S. Securities and Exchange Commission's Electronic Data Gathering, Analysis, and Retrieval system
14 Feb 2017
U.S. Securities and Exchange Commission's Electronic Data Gathering, Analysis, and Retrieval system
21 Dec 2016
U.S. Securities and Exchange Commission's Electronic Data Gathering, Analysis, and Retrieval system
28 Jul 2016 as Versum Materials US LLC
Patent: Compositions and methods for depositing silicon nitride films
29 Jan 2016 as Versum Materials US LLC
Patent: Method and precursors for producing 3D devices
28 Aug 2015 as Versum Materials US LLC
Patent: Ultrasonic Liquid Level Measurement System
16 Jun 2015 as Versum Materials US LLC
Patent: Composition for vapor/gas phase deposition of a dielectric film comprising an alkyl-alkoxysilacyclic compound
3 Oct 2014 as Versum Materials US LLC
Patent: Methods for Depositing Silicon Nitride Films
13 Aug 2013 as Versum Materials US LLC
Patent: Precursors for GST films in ALD/CVD processes
24 May 2013 as Versum Materials US LLC
Patent: Container with filter
1 Jun 2012 as Versum Materials US LLC
Patent: Compositions and Processes for Deposition of Carbon-Doped Silicon-Containing Films
25 Apr 2012 as Versum Materials US LLC
Patent: Cleaning Lead-Frames to Improve Wirebonding Process
19 Oct 2011 as Versum Materials US LLC
Patent: Tank Comprising a Valve-box
10 Jun 2011 as Versum Materials US LLC
Patent: Cylinder surface treatment for monochlorosilane
4 Feb 2011 as Versum Materials US LLC
Patent: Methods to Prepare Silicon-Containing Films
23 Dec 2010 as Versum Materials US LLC
Patent: Precursors for Providing Materials with low Dielectric Constant and Superior Integration Attributes
There are no publications matching your search.

Mentions

31 Jul 2024 in Psc
Companies House - Persons with Significant Control
1 Jun 2023 in Ler
Direct parent
1 Jun 2023 in Ler
Ultimate parent
29 Jan 2022 in Ler
Direct parent
29 Jan 2022 in Ler
Ultimate parent
8 Feb 2021 in Ler
No longer Ultimate parent
8 Feb 2021 in Ler
No longer Ultimate parent
There are no publications matching your search.

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