European Companies Search Engine

EU funding (€26.8M): Pilot Integration of 3nm Semiconducter technology Hor20 May 2019 EU Research and Innovation programme "Horizon"

Overview

Text

Pilot Integration of 3nm Semiconducter technology

The overall objective of the PIn3S project is to realize Pilot Integration of 3nm Semiconductor technology. This covers Process Integration, creation of Lithography Equipment, EUV Mask Repair Equipment and Metrology tools capable to deal with 3D structures, defects analysis, overlay and feature size evaluation. Each of these objectives will be achieved by cooperation between key European equipment developers like; ASML, Zeiss, Thermo Fisher, Applied Materials, Nova, KTI involved with their suppliers, involvement of a strong knowledge network based on Universities of Germany, Heidelberg University Hospital, and the Netherland, TU Delft and the University of Twente, complemented with key Technology Institutes such as imec and Fraunhofer. The project addresses Section 15 “Electronics Components & Systems Process Technology, Equipment, Materials and Manufacturing”, Major Challenge 4 “Maintaining world leadership in Semiconductor Equipment, Materials and Manufacturing solutions” and Major Challenge 1 “Developing advanced logic and memory technology for nanoscale integration and application-driven performance” of the ECSEL JU Annual Work Plan 2018. As set out in the Multi Annual Strategic Plan 2018, PIn3S addresses the ambition for the European Equipment & Manufacturing industry for advanced semiconductor technologies to lead the world in miniaturization by supplying new equipment and materials approximately two years ahead of introduction of volume production of advanced semiconductor manufacturers. With the results of the Pin3S project the consortium builds on realizing IC manufacturers to migrate to the 3nm Technology node which enables a class of new products which have more functionality, more performance and are more power efficient. As such it will form the bases for innovations yet to come enabling solutions that address the societal challenges in communication, mobility, health care, security, energy and safety & security.


Funded Companies:

Company name Funding amount
Applied Materials Belgium €51,188
APPLIED MATERIALS ISRAEL Ltd. €1,001,150
ASML BERLIN GmbH €1,422,688
ASML NETHERLANDS B.V. €4,445,477
CARL ZEISS MICROSCOPY GmbH €0.00
CARL ZEISS SMT GmbH €5,913,176
Coventor Sàrl €259,696
FEI ELECTRON OPTICS B.V. €690,250
FRAUNHOFER GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG e. V. €932,446
Interuniversitair Micro-Electronica Centrum €5,779,130
Ion Beam Services €265,795
KLA-TENCOR CORPORATION (ISRAEL) €1,508,325
KLA-Tencor MIE GmbH €0.00
LAM Research Belgium €0.00
NOVA Ltd. €796,478
Pfeiffer Vacuum €196,909
PRODRIVE TECHNOLOGIES B.V. €828,750
PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V. €0.00
Recif Technologies €99,109
REDEN B.V. €79,828
SCIA SYSTEMS GmbH €121,442
SIOUX TECHNOLOGIES B.V. €703,931
SOLMATES B.V. €151,438
TECHNISCHE UNIVERSITEIT DELFT €296,176
Universitatea Politehnica Din Bucuresti €0.00
UNIVERSITEIT TWENTE €975,166
VDL ETG TECHNOLOGY & DEVELOPMENT B.V. €233,870
VDL ETG TECHNOLOGY AND DEVELOPMENT HENGELO B.V. €0.00

Source: https://cordis.europa.eu/project/id/826422

The filing refers to a past date, and does not necessarily reflect the current state.

Creative Commons License The visualizations for "Applied Materials Belgium - EU funding (€26.8M): Pilot Integration of 3nm Semiconducter technology" are provided by North Data and may be reused under the terms of the Creative Commons CC-BY license.